Display device and manufacturing method thereof
US7638358B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 17, 2006 |
| Grant date | Dec 29, 2009 |
| Priority date | — |
| Expiry date | Nov 24, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/221
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
According to an embodiment of the present invention, a manufacturing method of a display device includes forming a plurality of gate wires comprising a gate electrode on an insulating substrate, forming an electrode layer comprising a source electrode and a drain electrode spaced apart from each other to define a channel region on the gate electrode interposed therebetween, forming a first barrier wall having a first opening for exposing the channel region, a portion of the source electrode, and a portion of the drain electrode on the electrode layer where the first barrier wall has a surface, forming a shielding film to cover the channel region inside the first opening, treating the surface of the first barrier wall, removing the shielding film, and forming an organic semiconductor layer inside the first opening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.