Patent · US Active

Real time target topography tracking during laser processing

US7638731B2 · kind B2 · utility

10Cited by
10References
25Claims
0Family size

Assignee

Inventor

Key dates

Filing dateOct 18, 2005
Grant dateDec 29, 2009
Priority date
Expiry dateDec 28, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/163
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

An efficient method of and a system for performing topography measurement facilitates increasing laser machining throughput. Topography measurements at multiple points on a target specimen or continuous real time measurement and monitoring of the target specimen surface topography and target specimen thickness can be performed during a laser machining process. Measurement of the thickness of the target specimen to be laser machined would permit fine tuning of laser energy delivered and result in higher quality target material removal.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.