Method, device and system for evaluating a lens for an electronic device
US7639353B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 9, 2006 |
| Grant date | Dec 29, 2009 |
| Priority date | — |
| Expiry date | Aug 9, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M11/0207
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The invention relates to a system, method and device for evaluating imperfections in a lens for a display for an electronic device. For the device, it comprises: a substrate; and a pattern imposed on the substrate. For the pattern, when the pattern is viewed through the lens, the pattern is noticeably distorted around an area where a defect is present in the lens. For the system, it comprises: an evaluation table for the lens, the table having a mounting area; and a substrate for mounting on the mounting area, the substrate having a pattern imposed thereon wherein when the pattern is viewed through the lens, the pattern is noticeably distorted around an area where a defect is present in the lens.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.