Position measurement apparatus and method and pattern forming apparatus and writing method
US7640142B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 26, 2006 |
| Grant date | Dec 29, 2009 |
| Priority date | — |
| Expiry date | Jan 9, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31793
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A position measurement apparatus includes a movable stage structure, a measurement unit using a laser to measure a moved position of the stage and to output a corresponding measured value, a first filter configured to attenuate a first component of a certain frequency region of the measured value outputted by the measurement unit, a second filter connected in parallel with the first filter configured to attenuate a second component other than the certain frequency region of the measured value outputted by the measurement unit, a third filter connected in series to the second filter with the series connection of the second and third filters connected in parallel with the first filter, configured to attenuate the first component of the certain frequency region of the measured value outputted by the measurement unit, and a processing unit configured to combine an output of the first filter and an output of the series connection of the second and third filters and to thereby output a first combined value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.