Imprint lithography apparatus and method employing an effective pressure
US7641468B2 · kind B2 · utility
8Cited by
24References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 1, 2004 |
| Grant date | Jan 5, 2010 |
| Priority date | — |
| Expiry date | Jun 9, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An imprint apparatus and method employ an effective pressure in imprint lithography. The imprint apparatus includes a compressible chamber that encloses an imprint mold having a mold pattern and a sample to be imprinted. The chamber is compressed to imprint the mold pattern on the sample. The mold is pressed against the sample with the effective pressure. The effective pressure is controlled by a selected ratio of a cavity area of the chamber to a contact area between the mold and the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.