Chemical vapor deposition reactor having multiple inlets
US7641939B2 · kind B2 · utility
3Cited by
21References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 31, 2007 |
| Grant date | Jan 5, 2010 |
| Priority date | — |
| Expiry date | Oct 31, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/403
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chemical vapor deposition reactor has a wafer carrier which cooperates with a chamber of the reactor to facilitate laminar flow of reaction gas within the chamber and a plurality of injectors configured in flow controllable zones so as to mitigate depletion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.