Rotary apertured interferometric lithography (RAIL)
US7642041B2 · kind B2 · utility
4Cited by
14References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 13, 2007 |
| Grant date | Jan 5, 2010 |
| Priority date | — |
| Expiry date | Dec 15, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/855
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A rotary apertured interferometric lithography (RAIL) system that includes interferometric lithography tools, a mask with a slit preferably with an arc shape, and a rotating stage is disclosed. The RAIL system could create a servo pattern of a recording-head trajectory of a hard disk drive in a master for magnetic-contact printing. The master can could be used to form arrays of sub-micron sized magnetic elements on a magnetic disk media for high-density magnetic recording applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.