Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part
US7643100B2 · kind B2 · utility
3Cited by
4References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 30, 2007 |
| Grant date | Jan 5, 2010 |
| Priority date | — |
| Expiry date | Jul 3, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/315
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.