Plasma coating system for accommodating substrates of different shapes
US7645492B2 · kind B2 · utility
6Cited by
9References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 30, 2004 |
| Grant date | Jan 12, 2010 |
| Priority date | — |
| Expiry date | Jun 14, 2025 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C59/142
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plasma coating system includes at least one coating station with a first side and a second side defining a pathway with at least one bend. The coating station also includes a first plasma arc that provides a plasma jet directed towards a substrate. The first plasma arc is positioned on either the first side or the second side of the bend.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.