Patent · US Active

Plasma generating electrode, plasma generator, and exhaust gas purifying device

US7648683B2 · kind B2 · utility

3Cited by
0References
13Claims
0Family size

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Key dates

Filing dateJun 25, 2004
Grant dateJan 19, 2010
Priority date
Expiry dateAug 26, 2026

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02T10/12
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A plasma generating electrode 1 of the present invention includes a plurality of unit electrodes 2 hierarchically layered at predetermined intervals, the unit electrodes 2 including a deficient unit electrode 2b in which a conductive film 4 has an absent portion and a normal unit electrode 2a in which the conductive film 4 does not have an absent portion. Spaces V formed between the unit electrodes 2 include a normal space Va formed so that the distance between conductive films 4 corresponds to the distance between the unit electrodes 2 and a deficient space Vb formed so that the distance between the conductive films 4 is greater than the distance between the conductive films 4 in the normal space Va. The plasma generating electrode 1 of the present invention can efficiently treat a plurality of predetermined components contained in a treatment target fluid by utilizing different types of plasma suitable for respective reactions by causing the treatment target fluid to flow only once.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.