Process for preparing metal or metal alloy nanoparticles dispersed on a substrate by chemical vapour deposition
US7648942B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 23, 2005 |
| Grant date | Jan 19, 2010 |
| Priority date | — |
| Expiry date | Apr 18, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/256
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Process of depositing nanoparticles of a metal or of an alloy of said metal, said metal being chosen from the metals from columns VIIIB and IB of the Periodic Table, dispersed on a substrate by chemical vapour deposition (CVD), from one or more precursors, in which the deposition is carried out in the presence of a gas comprising more than 50 vol % of a reactive oxidizing gas.Substrate comprising at least one surface, dispersed on which are nanoparticles made of a metal or of an alloy of metals, for example made of silver or a silver alloy.Use of the substrate to catalyse a chemical reaction, for example an NOx elimination reaction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.