Extreme UV radiation focusing mirror and extreme UV radiation source device
US7649186B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 18, 2007 |
| Grant date | Jan 19, 2010 |
| Priority date | — |
| Expiry date | Jul 20, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
In an EUV focusing mirror in which there are several thin concave nested high precision mirrors in the form of an ellipsoid of revolution, a paraboloid of revolution, a Wolter type or the like, the sides which do not constitute the reflection surfaces are made in the shape of a knife edge at the radiation incident ends of the respective mirrors in order not to be shielded by the thickness of the radiation incidence sides of the respective mirrors. Likewise, the radiation exit ends of the respective mirrors are made in the form of a knife edge. This yields an advantageous far-field distribution use of the mirrors for an EUV radiation source device and the degree of reduction of the light intensity can be made smaller than in the conventional case.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.