Developing apparatus including developer carrying member and developer regulating member with surface roughness parameters
US7650104B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 23, 2007 |
| Grant date | Jan 19, 2010 |
| Priority date | — |
| Expiry date | Jul 20, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G15/0812
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A developing apparatus includes: a developing sleeve that carries a mono-component developer; and a developing blade that abuts on the sleeve to regulate a layer thickness of the developer on the sleeve, wherein surface roughness parameters of the sleeve satisfy: 3.0≦Rpk≦9.0; and 2≦Pc2≦10. At an abutment portion between the sleeve and the blade, surface roughness parameters of the blade satisfy: 0.030≦Sm≦0.170; and 0.10≦Rvk×(100−Mr2)/100≦1.30, where Sm is a mean spacing of profile irregularities [mm]; Rpk is an initial wear height [μm]; Rvk is an oil retaining depth [μm]; Mr2 is a profile bearing length ratio 2 [%]; and Pc2 denotes the number of profile peaks having a height larger than a count level from a center line per the evaluation length of 1 mm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.