Device for applying electromagnetic microwave radiation in a plasma cavity
US7650853B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2002 |
| Grant date | Jan 26, 2010 |
| Priority date | — |
| Expiry date | Dec 3, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/511
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A device for applying, in use, electromagnetic microwave radiation in a plasma cavity. The device includes a plasma cavity present within a housing, being substantially cylindrically symmetric about a first axis, and which plasma cavity includes a cylindrical wall provided with a circumferential slit. The plasma cavity is in communication, via the slit, with a first end of an elongated microwave guide having a longitudinally extending second axis. The device is in communication in use with a microwave generating device via the other end of the microwave guide, in which the electromagnetic microwave radiation being generated may include several modes, where the device can, in use, generate microwave radiation in the slit, which microwave radiation has only one electromagnetic field distribution at least in one direction perpendicularly to the propagation direction of the microwave radiation in the microwave guide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.