Method of producing a nanohole on a structure by removal of projections and anodic oxidation
US7651736B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2007 |
| Grant date | Jan 26, 2010 |
| Priority date | — |
| Expiry date | May 6, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2203/0361
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention provides a method of producing a structure, which is capable of easily obtaining a structure of the nanometer scale by using an anodic oxidation method. A method of producing a structure with a hole includes: forming first projected structures regularly arranged on a substrate; forming a first anodic oxidating layer on the substrate having the first projected structures, thereby forming first recessed structures at center portions of cells formed by the projected structures on the anodic oxidating layer; removing the first projected structures to form holes; and subjecting the first anodic oxidating layer to anodic oxidation to form holes at positions of the first recessed structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.