Rapid patterning of nanostructures
US7651926B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 12, 2006 |
| Grant date | Jan 26, 2010 |
| Priority date | — |
| Expiry date | Aug 26, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/962
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for forming nanostructures comprises generating charged nanoparticles with an electrospray system in a vacuum chamber and introduction of the charged nanoparticles to a region proximate to a charge pattern, so that the particles adhere to the charge pattern in order to form the feature. Two- or three-dimensional nanostructures may be formed by rapidly creating a charge pattern of nanoscale dimensions on a substrate using a normal electron beam or a microcolumn electron beam, generating high purity nanoscale or molecular size scale building blocks of a first type that image the charge pattern using the electrospray system, and then optionally sintering the building blocks to form the feature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.