Method for manufacturing antenna and method for manufacturing semiconductor device
US7651932B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 15, 2006 |
| Grant date | Jan 26, 2010 |
| Priority date | — |
| Expiry date | Aug 16, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/02
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides an antenna with low resistance and a semiconductor device having an antenna whose communication distance is improved. A fluid containing conductive particles is applied over an object. After curing the fluid containing the conductive particles, the fluid is irradiated with a laser to form an antenna. As a method for applying the fluid containing the conductive particles, screen printing, spin coating, dipping, or a droplet discharging method is used. Further, a solid laser having a wavelength of 1 nm or more and 380 nm or less is used as the laser.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.