Patent · US Active

Method for manufacturing antenna and method for manufacturing semiconductor device

US7651932B2 · kind B2 · utility

11Cited by
2References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 15, 2006
Grant dateJan 26, 2010
Priority date
Expiry dateAug 16, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K3/02
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The present invention provides an antenna with low resistance and a semiconductor device having an antenna whose communication distance is improved. A fluid containing conductive particles is applied over an object. After curing the fluid containing the conductive particles, the fluid is irradiated with a laser to form an antenna. As a method for applying the fluid containing the conductive particles, screen printing, spin coating, dipping, or a droplet discharging method is used. Further, a solid laser having a wavelength of 1 nm or more and 380 nm or less is used as the laser.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.