Direct write# system
US7658163B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 20, 2006 |
| Grant date | Feb 9, 2010 |
| Priority date | — |
| Expiry date | Aug 2, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/102
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Methods and apparatus for the deposition of a source material (10) are disclosed. An atomizer (12) renders a supply of source material (10) into many discrete particles. A force applicator (14) propels the particles in continuous, parallel streams of discrete particles. A collimator (16) controls the direction of flight of the particles in the stream prior to their deposition on a substrate (18). In an alternative embodiment of the invention, the viscosity of the particles may be controlled to enable complex depositions of non-conformal or three-dimensional surfaces. The invention also includes a wide variety of substrate treatments which may occur before, during or after deposition. In yet another embodiment of the invention, a virtual or cascade impactor may be employed to remove selected particles from the deposition stream.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.