Quartz glass having excellent resistance against plasma corrosion and method for producing the same
US7661277B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 21, 2007 |
| Grant date | Feb 16, 2010 |
| Priority date | — |
| Expiry date | Dec 21, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2203/40
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
As a jig material to use under plasma reaction for producing semiconductors, the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without causing anomalies to silicon wafers; the present invention furthermore provides a quartz glass jig, and a method for producing the same. A quartz glass containing 0.1 to 20 wt % in total of two or more types of metallic elements, said metallic elements comprising at least one type of metallic element selected from Group 3B of the periodic table as a first metallic element and at least one type of metallic element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids as a second metallic element, provided that the maximum concentration of each of the second metallic elements is 1.0 wt % or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.