Interspinous process implants and methods of use
US7662187B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 29, 2007 |
| Grant date | Feb 16, 2010 |
| Priority date | — |
| Expiry date | Jul 7, 2027 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B17/842
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.