Decal transfer lithography
US7662545B2 · kind B2 · utility
216Cited by
42References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 14, 2004 |
| Grant date | Feb 16, 2010 |
| Priority date | — |
| Expiry date | Mar 5, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/038
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.