III-nitride light emitting device with reduced strain light emitting layer
US7663148B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 22, 2006 |
| Grant date | Feb 16, 2010 |
| Priority date | — |
| Expiry date | Dec 22, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/82
Abstract
In accordance with embodiments of the invention, strain is reduced in the light emitting layer of a III-nitride device by including a strain-relieved layer in the device. The surface on which the strain-relieved layer is grown is configured such that strain-relieved layer can expand laterally and at least partially relax. In some embodiments of the invention, the strain-relieved layer is grown over a textured semiconductor layer or a mask layer. In some embodiments of the invention, the strain-relieved layer is group of posts of semiconductor material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.