Patent · US Active

Spine distraction implant and method

US7666209B2 · kind B2 · utility

128Cited by

155References

27Claims

0Family size

Assignee

KYPHON SARL · CH

Inventors

James F. Zucherman · San Francisco, US
Ken Y. Hsu · San Francisco, US
T. Wade Fallin · Hyde Park, US
Henry A. Klyce · Piedmont, US

Key dates

Filing date	Mar 28, 2007
Grant date	Feb 23, 2010
Priority date	—
Expiry date	Mar 28, 2027

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S606/91
WIPO fieldPharmaceuticals
WIPO sectorChemistry

Abstract

A spine distraction implant alleviates pain associated with spinal stenosis and facet arthropathy by expanding the volume in the spine canal and/or neural foramen. The implant provides a spinal extension stop while allowing freedom of spinal flexion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.