Process and apparatus for removing Bronsted acid impurities in binary halides
US7666379B2 · kind B2 · utility
1Cited by
24References
31Claims
0Family size
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Key dates
| Filing date | Dec 2, 2005 |
| Grant date | Feb 23, 2010 |
| Priority date | — |
| Expiry date | Dec 2, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/10784
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A process and apparatus is provided for the purification of binary halide fluid. The process and apparatus purifies the binary halide fluid by selectively removing Bronsted acid impurities and/or volatile oxygen containing impurities present in the binary halide. A regenerable adsorbent polymer is utilized to remove the Bronsted acid impurities from the binary halide fluid and a volatile oxide adsorbent having a specific adsorption capacity for the volatile oxide impurity is utilized to remove the volatile oxide from the binary halide when in gaseous form.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.