Patent · US Active

Tantalum and niobium compounds

US7667038B2 · kind B2 · utility

1Cited by

2References

13Claims

0Family size

Assignee

H.C. STARCK INC. · US

Inventors

Knud Reuter · Krefeld, DE
Daniel Gaess · Burghausen, DE
Jörg Sundermeyer · Marburg, DE

Key dates

Filing date	Oct 10, 2008
Grant date	Feb 23, 2010
Priority date	—
Expiry date	Oct 10, 2028

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/28556
WIPO fieldOrganic fine chemistry
WIPO sectorChemistry

Abstract

The present invention relates to specific, novel tantalum and niobium compounds which can serve as starting materials for the preparation of chemical vapour deposition (CVD) precursors.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.