System and method for projection
US7670006B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 23, 2006 |
| Grant date | Mar 2, 2010 |
| Priority date | — |
| Expiry date | Jan 2, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N9/3185
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A pattern projector including a source of light to be projected, a spatial light modulator arranged in a spatial light modulator plane, the spatial light modulator receiving the light from the source of light and being configured to pass the light therethrough in a first pattern and projection optics receiving the light from the spatial light modulator and being operative to project a desired second pattern onto a projection surface lying in a projection surface plane which is angled with respect to the spatial light modulator plane, the first pattern being a distortion of the desired second pattern configured such that keystone distortions resulting from the difference in angular orientations of the spatial light modulator plane and the projection surface plane are compensated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.