Apparatus for forming fine pattern on substrate
US7670128B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Dec 28, 2005 |
| Grant date | Mar 2, 2010 |
| Priority date | — |
| Expiry date | Dec 30, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An apparatus of forming a fine pattern includes a chamber having a predetermined process space, a stage for supporting a substrate on which a photosensitive organic layer is formed, using buoyancy, a template disposed away from the stage to imprint a preprocess pattern dividing etching and non-etching regions on the organic layer of the substrate, and a driving unit for moving the stage toward the template so that the pattern formed on the template can be formed on the organic layer of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.