Sulfidation-resistant silver-base coating, method for depositing such a coating and use thereof
US7670689B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 23, 2006 |
| Grant date | Mar 2, 2010 |
| Priority date | — |
| Expiry date | Aug 1, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/0084
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The sulfidation resistance of a silver-base material coating is further improved by making a concentration gradient of silver, oxygen and of one or more oxidizable alloying elements that may be present in the material, from the free surface of the coating up to a depth comprised between 10 nm and 1 μm and more particularly between 100 nm and 1 μm. Thus, the coating comprises a stack of one main layer made from silver-base material and of one oxidized thin film. The thin film, with a thickness comprised between 10 nm and 1 μm, thus presents a decreasing silver concentration gradient from the interface between the thin film and the main layer to the free surface of the thin film. Deposition of the coating on a support can be achieved by two successive physical vapor deposition steps, and more particularly by magnetron cathode sputtering.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.