Phosphoric acid ester containing photoconductors
US7670735B2 · kind B2 · utility
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19References
24Claims
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Key dates
| Filing date | Aug 1, 2006 |
| Grant date | Mar 2, 2010 |
| Priority date | — |
| Expiry date | Dec 12, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G5/144
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoconductor containing a substrate, a layer thereover wherein the layer comprises, for example, a polyol resin, an aminoplast resin, an ester of phosphoric acid adhesion component, and a metal oxide; and at least one imaging layer of, for example, a photogenerating layer and a charge transport layer formed on the polyol resin containing layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.