Slurry monitoring system and method
US7671753B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 17, 2006 |
| Grant date | Mar 2, 2010 |
| Priority date | — |
| Expiry date | Jul 8, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06Q10/00
- WIPO fieldIT methods for management
- WIPO sectorElectrical engineering
Abstract
System and method are disclosed for monitoring slurry from a central location and replenishing the slurry as needed. The method/system allows a slurry supplier to track various properties of the slurry, as well as monitor various aspects of the slurry storage and delivery system. When the volume of slurry at the remote location falls below a predetermined point, the slurry supplier can schedule both the production of the appropriate slurry and its timely delivery to the customer. Changes in the condition of existing slurry, as well as leaks and other malfunctions in the slurry storage system, may be promptly detected and the slurry supplier immediately notified so that corrective actions may be taken. Multiple slurry storage systems at several remote locations may be monitored simultaneously from the central location. Such an arrangement offers a complete, one-stop solution to customers whose businesses depend on a reliable supply of “field ready” slurry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.