Patent · US Active

Replication tools and related fabrication methods and apparatus

US7674103B2 · kind B2 · utility

11Cited by
7References
10Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJan 20, 2006
Grant dateMar 9, 2010
Priority date
Expiry dateDec 24, 2028

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB29L2031/757
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.