Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method
US7674339B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 19, 2003 |
| Grant date | Mar 9, 2010 |
| Priority date | — |
| Expiry date | Oct 16, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23G5/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention relates to a method of cleaning the surface of a material (4) that is coated with an organic substance. The inventive method is characterised in that it comprises the following steps, consisting in: introducing the material (4) into a treatment chamber (2), having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90 volume percent of oxygen; and generating a plasma by passing an electric discharge between the surface of the material and a dielectric-covered electrode (5a, 5b, 5c, 5d, 5e, 5f, 5g) in order to break down the organic substance under the action of the free radicals O thus produced. The invention also relates to an installation (1) that is used to carry out said method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.