Patent · US Active

Method for manufacturing layered periodic structures

US7674573B2 · kind B2 · utility

0Cited by

4References

18Claims

0Family size

Assignee

Canon Kabushiki Kaisha · JP

Inventors

Mamoru Miyawaki · Yokohama, JP
Jiang Cao · Shanghai, CN

Key dates

Filing date	Aug 8, 2006
Grant date	Mar 9, 2010
Priority date	—
Expiry date	Sep 22, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG02B5/3008
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of manufacturing a periodic grating structure for a component. The method includes forming first structured layer including a final periodic grating structure of a first material and a second material filling spaces between individual features of the final periodic grating structure, removing the second material using a first chemical process and annealing a portion of the first material into a third material using a second chemical process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.