Uniform color filter arrays in a moat
US7675080B2 · kind B2 · utility
193Cited by
11References
29Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 10, 2006 |
| Grant date | Mar 9, 2010 |
| Priority date | — |
| Expiry date | Feb 9, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/8063
Abstract
A method and apparatus for improving the planarity of a recessed color filter array when the recessed region or trench depth exceeds the thickness of the color filter film. The method includes the steps of coating the entire wafer with an additional coating material after applying the CFA, then planarizing that resist layer using CMP and then using a dry etch to transfer that planar surface down as far as required to achieve a planar color filter with a uniform thickness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.