First surface mirror with silicon-metal oxide nucleation layer
US7678459B2 · kind B2 · utility
7Cited by
19References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 24, 2007 |
| Grant date | Mar 16, 2010 |
| Priority date | — |
| Expiry date | Feb 16, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A first surface mirror includes a reflective layer and one or more dielectric layers. In certain example embodiments, a silicon metal oxide (e.g., silicon aluminum oxide) inclusive nucleation layer(s) is provided above and/or below the reflective layer in order to improve durability of the first surface mirror.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.