Graded topcoat materials for immersion lithography
US7678537B2 · kind B2 · utility
31Cited by
1References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 31, 2008 |
| Grant date | Mar 16, 2010 |
| Priority date | — |
| Expiry date | Mar 31, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/952
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.