Dense plasma focus apparatus
US7679025B1 · kind B1 · utility
Inventors
Key dates
| Filing date | Feb 4, 2005 |
| Grant date | Mar 16, 2010 |
| Priority date | — |
| Expiry date | Feb 4, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/48
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus for the formation of a dense plasma focus (DPF) has a center electrode formed about an axis, where the center electrode includes a cylindrical part and a tapered part. An outer electrode is formed about the center electrode, and may be either cylindrical, tapered, or formed from a plurality of individual conductors including a helical conductor arrangement surrounding the tapered region of the center conductor. The taper of the center electrode results in an enhanced azimuthal B field in the final region of the device, resulting in increased plasma velocity prior to the dense plasma focus. Using the outer electrode helical structure an auxiliary axial B field is generated during the final acceleration region of the plasma, which reduces axial modal tearing of the plasma in the final acceleration region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.