Embedded nanoparticle films and method for their formation in selective areas on a surface
US7682591B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 25, 2008 |
| Grant date | Mar 23, 2010 |
| Priority date | — |
| Expiry date | Aug 25, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2918
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The invention is directed to a method of positioning nanoparticles on a patterned substrate. The method comprises providing a patterned substrate with selectively positioned recesses, and applying a solution or suspension of nanoparticles to the patterned substrate to form a wetted substrate. A wiper member is dragged across the surface of the wetted substrate to remove a portion of the applied nanoparticles from the wetted substrate, and leaving a substantial number of the remaining portion of the applied nanoparticles disposed in the selectively positioned recesses of the substrate. The invention is also directed to a method of making carbon nanotubes from the positioned nanoparticles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.