Plasma source

US7683342B2 · kind B2 · utility

Assignees

• Max-Planck-Gesellschaft zur Föderung der Wissenschaften e.V. · US
• Adtec Europe Ltd. · GB

Inventors

• Gregor Morfill · Birkenfeld, DE
• Tetsuji Shimizu · Garching bei München, DE
• Bernd Steffes · Garching bei München, DE
• Shuitsu Fujii · Hiroshima, JP

Key dates

• Filing date: Sep 11, 2006
• Grant date: Mar 23, 2010
• Expiry date: Nov 8, 2026

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05H1/463
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

A plasma source, particularly for disinfection of wounds, comprising: an ionization chamber having an inlet for introducing a gas into the ionization chamber and further having an outlet for dispensing the ionized gas onto an object; several ionization electrodes being disposed within the ionization chamber for ionizing the gas and a predetermined ratio of the electrode-electrode distance on the one hand and the electrode-wall distance on the other hand, wherein the ratio is in a range approximately between about 1.8 and about 2.2.