Method for detection and scoring of hot spots in a design layout
US7685558B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 6, 2007 |
| Grant date | Mar 23, 2010 |
| Priority date | — |
| Expiry date | Nov 6, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/398
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for detection and scoring of hotspots in a design layout is provided. A plurality of indices is derived for a plurality of positions in the design layout. The plurality of indices comprises a first index sensitive to energy exposure of the design layout, a second index sensitive to process image formation, and a third index sensitive to mask manufacturing error. The plurality of indices is then analyzed to identify at least one hotspot in the design layout. The at least one hotspot is then prioritized using an integrated hotspot scoring system. The integrated hotspot scoring system prioritizes hotspots based on a look-up table approach or an interpolation approach.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.