Supporting mechanism of reflector and projection apparatus
US7686458B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2005 |
| Grant date | Mar 30, 2010 |
| Priority date | — |
| Expiry date | Jun 21, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B21/10
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reflection surface (1a) of a mirror (1) has a rotationally-symmetrical shape about an optical axis (110). The mirror (1) is rotatably supported by a pivot supporting portion (41) on the position of the optical axis (110) of the reflection surface (1a) or in the vicinity of the optical axis (110). Furthermore, the mirror (1) is slidably supported by slide supporting portions (42) at two positions on the upper part thereof. With such a configuration, the mirror (1) is supported at three points. Further, even when the mirror (1) expands and contracts due to the change in temperature or the like, the deformation of the reflection surface (1a) of the mirror (1) is prevented by the action of the slide supporting portions (42). As a result, it is possible to prevent the generation of distortion of an image projected on a screen (300).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.