Mold for nano imprinting
US7687007B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 16, 2003 |
| Grant date | Mar 30, 2010 |
| Priority date | — |
| Expiry date | Oct 27, 2025 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C33/424
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Method for manufacturing a mold tool (1), devised for forming a structured nanoscale pattern on an object (24) and having a layer (16) which is anti-adhesive with regard to the object (24). A stamp blank (2) is provided with a structured pattern (4) on a surface (8). The patterned surface (8) is coated with a layer (6) of a metal, which has a stable oxidation number and can form a mechanically stable oxide film. The metal layer (6) is oxidized for forming of an oxide film (10). The oxide film (10) is exposed to a reagent comprising molecule chains (18), each of which has a linkage group (20) which bonds to the oxide film (10) by chemical bonding, wherein the molecule chains (18) either at the outset comprise at least a group (22) comprising fluorine, or in a subsequent step is provided with at least one such group (22).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.