Patent · US Active

Arrangement for monitoring thermal spray processes

US7688441B2 · kind B2 · utility

1Cited by

5References

4Claims

0Family size

Assignee

MTU Aero Engines AG · DE

Inventors

Manuel Hertter · Munich, DE
Joerg Hoeschele · Stuttgart, DE
Stefan Schneiderbanger · Lauterbach, DE
Juergen Steinwandel · Überlingen, DE

Key dates

Filing date	Mar 30, 2006
Grant date	Mar 30, 2010
Priority date	—
Expiry date	Mar 15, 2027

Classification

Technology area (CPC H)Electricity
CPC primaryH05H1/0025
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

An arrangement for measuring characteristic properties of a plasma beam in a thermal spray process, including a device for introducing spray materials into the plasma, a one-dimensional or two-dimensional array including first optical waveguides for receiving the light radiation emitted by the plasma, and other optical waveguides for distributing the light radiation emitted by the plasma. A device is provided for splitting the light guided in the first optical waveguides into the other optical wave guides, one optical waveguide being connected to the opening diaphragm of a particle flow arrangement, and the other optical waveguide being connected to the opening diaphragm of a spectrometer. A device is also provided for determining the current state of the spray process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.