Method and apparatus for depositing material onto a surface
US7690325B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 29, 2005 |
| Grant date | Apr 6, 2010 |
| Priority date | — |
| Expiry date | Oct 25, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01L2400/0406
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Some embodiments of the present invention provide an apparatus and method in which material is deposited upon a surface from an elongated beam having an aperture defined therein through which the material is moved by passive adsorption. The elongated beam can be substantially planar along substantially its entire length, can be oriented at an acute angle with respect to the surface during deposition processes, and can have a length no greater than about 2 mm. In some embodiments, the aperture can be elongated, can extend from a material reservoir to a location short of the terminal end of the elongated beam or through the terminal end of the elongated beam, and can have a portion extending through the thickness of the elongated beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.