Antireflective compositions for photoresists
US7691556B2 · kind B2 · utility
18Cited by
32References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2005 |
| Grant date | Apr 6, 2010 |
| Priority date | — |
| Expiry date | Sep 15, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.