Gas filling apparatus and gas filling port thereof
US7694498B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2008 |
| Grant date | Apr 13, 2010 |
| Priority date | — |
| Expiry date | Dec 18, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67393
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides a gas filling apparatus and gas filling port thereof. The gas filling apparatus is connected with the air feed apparatus which is introduced the gas into the first inlet port of the semiconductor device or reticle storage apparatus. The gas filling apparatus includes a supporting base which is provided to hold the storage apparatus thereon, and at least one second inlet port which is disposed on the first inlet port of the storage apparatus so as to the gas is flowed into the storage apparatus through the second inlet port. The second inlet port includes a first base, a second base, a first elastic element, a fixing element, and a switch device. Both of the first base and second base have through holes, and opposite to each other. The first elastic element is used to maintain the airtight and is disposed on the second base and opposite to the first inlet port of the storage apparatus used to maintain the airtight. The fixing element is used to fix the elastic element on the second base. The switch device is disposed on the gap in the middle of the first base and the second base, and is provided to control the input or output for the gas of the second …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.