MEMS device formed inside hermetic chamber having getter film
US7696622B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 26, 2008 |
| Grant date | Apr 13, 2010 |
| Priority date | — |
| Expiry date | Jun 26, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B7/0038
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A MEMS device including a getter film formed inside a hermetic chamber provides stable performance of the MEMS device by electrically stabilizing the getter film. The MEMS device includes a movable portion and a fixed portion formed inside the hermetic chamber. The hermetic chamber is formed by a base material of the MEMS device and glass substrates and having a cavity and cavities made therein. A part of any continuous getter film formed inside the hermetic chamber connects to only one of any one or a plurality of predetermined electrical potentials of the fixed portion and a ground potential of the fixed portion through the base material of the MEMS device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.