Apparatus and method of treating exhaust gas
US7700051B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 25, 2004 |
| Grant date | Apr 20, 2010 |
| Priority date | — |
| Expiry date | May 7, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/0898
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An exhaust gas treating apparatus 1 includes; a case body 2 and a plasma producing means 3 capable of producing plasma inside the case body 2 and treats the substances to be treated contained in the exhaust gas by the plasma producing means 3. The plasma producing means 3 has one or more each of a pulse electrode 4 and a ground electrode 5 that are oppositely disposed in the case body 2 and has a pulse power source 6 capable of feeding a pulse current to the pulse electrode 4 by switching frequency and/or voltage for different values at predetermined time intervals. The substances to be treated contained in the exhaust gas can selectively be treated by switching frequency and/or voltage value for different values at predetermined time intervals so that plasma of a kind adequate for the substances to be treated contained in an exhaust gas is produced between the pulse electrode 4 and the ground electrode 5.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.