Patent · US Active

Wafer/Ingot cleaning in wire saw cutting comprising an ethoxylated alcohol/polyalkylsiloxane mixture

US7700535B1 · kind B1 · utility

1Cited by
6References
11Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJan 12, 2009
Grant dateApr 20, 2010
Priority date
Expiry dateJan 12, 2029

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC11D2111/22
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

There is provided a method and composition for rinsing sliced ingots into wafers from a wire saw cutting operation. The method uses an alkoxylated alcohol diluted in water alone or with a polyalkyl siloxane when the bath has a dynamic flow of water to prevent foaming.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.