Apparatus, system, and method for detecting cracking within an aftertreatment device
US7701231B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 20, 2007 |
| Grant date | Apr 20, 2010 |
| Priority date | — |
| Expiry date | Feb 5, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2273/18
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus, system, and method are disclosed for detecting cracking in a particulate filter. The method may include providing an apparatus comprising an aftertreatment device with a substrate and a substrate surface, a conductive material forming a conduction path bonded to the surface of the substrate surface, and access points configured to allow a resistance measurement of the conduction path. The method may include measuring the resistance of the conduction path, and determining if one or more cracks have occurred on the substrate surface based on the resistance measurement. The method may further include labeling the degradation level of the aftertreatment device based on the indicated amount of cracking, and replacing the aftertreatment device with an equivalent aftertreatment device, based on the degradation level, after a service event.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.